The ultrafast pump-probe detection system primarily utilizes the optical path difference between the pump and probe light to perform tests. Initially, a laser beam is directed onto the sample, causing a certain degree of damage on the sample surface. Due to the rapid nature of this process (in the picosecond range), continuous capture with a camera alone cannot fully observe the entire damage process. In this instrument, after each laser pulse strikes the sample, the delay line can be adjusted to vary the delay between the two light pulses, thereby capturing the damage of the sample at different time points after the laser hits it.

product details

Application instance

Video Introduction

Main Technical Specifications

High-SpeedOptical Delay Line	Maximumspeed of optical delay line is 400mm/s, with an accuracy of 0.1 micrometers.
DetectionTime Window Range	8ns
Detector	ICCD(Intensified Charge-Coupled Device)
DetectionTime Resolution	1.5times the laser pulse width
ExcitationLight Focusing Lens	20X,50X (optional)
Functionalities	Ultrafast optical damage detection,plasma sputtering detection Pump and probe lightpaths are each equipped with BBO crystals for frequency
doubling (switchable) Imaging Lens (connected to CCD) withadjustable magnification (2x-24x) Fully automatic two-dimensionalelectrically controlled sample stage (software-controlled)

Ultrafast time-resolved optical damage detection

As shown in the diagram, the entire data acquisition processcan detect the extent of laser-induced damage on the sample surface atdifferent ultrafast time scales.

Ultra fast time-resolved optical damage detection

This function mainly utilizes the camera's gate acquisition function and delay to capture the plasma sputtering process of samples at different times. The entire testing process involves focusing the laser on the sample, which generates plasma. At this time, the camera's exposure time is fixed, which is equivalent to a "gate". Then, by adjusting the timing, the "gate" is delayed relative to the time when the laser hits the sample to 0, and the sputtering process of plasma at different times is captured separately. This feature can also be used for long-term scale testing.

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